Light emitting diodes and methods for manufacturing light emitting diodes

ABSTRACT

Light emitting diodes and methods for manufacturing light emitting diodes are disclosed herein. In one embodiment, a method for manufacturing a light emitting diode (LED) comprises applying a first light conversion material to a first region on the LED and applying a second light conversion material to a second, different region on the LED. A portion of the LED is exposed after applying the first and second light conversion materials.

TECHNICAL FIELD

The present disclosure is directed generally to light emitting diodesand methods for manufacturing light emitting diodes.

BACKGROUND

Light emitting diodes (LEDs) are an efficient source of bright light forcomputer monitors, televisions, cellphones, digital cameras, and avariety of other electronic devices and applications. White light LEDscan also be used in general lighting, architectural, outdoor,commercial, and/or residential illumination. True white light LEDs,however, are not available because LEDs typically only emit at oneparticular wavelength. For human eyes to perceive the color white, amixture of wavelengths is needed.

One conventional technique for emulating white light with LEDs includesdepositing a light conversion material (e.g., a phosphor) on a basematerial (e.g., indium gallium nitride (InGaN)). In operation, the InGaNbase material emits a blue light that stimulates the light conversionmaterial to emit a yellow light. Because yellow light stimulates the redand green receptors of a human eye, the resulting mix of blue and yellowlight gives the appearance of white to the eye if the base material andlight conversion material are matched appropriately. If not matchedappropriately, however, the combined emissions appear off white and mayreduce color fidelity of electronic devices.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A is a partially schematic illustration of a representativemicroelectronic workpiece carrying microelectronic devices configured inaccordance with embodiments of the technology.

FIG. 1B is a schematic illustration of a microelectronic devicesingulated from the workpiece shown in FIG. 1A.

FIGS. 2A-6 illustrate various stages of a method for selectivelyapplying light conversion materials onto LEDs in accordance withembodiments of the technology.

FIG. 7 is a partially schematic, top view of a portion of amicroelectronic workpiece after selectively applying light conversionmaterials onto an LED in accordance with another embodiment of thetechnology.

FIG. 8 is a partially schematic, top view of a portion of amicroelectronic workpiece after selectively applying light conversionmaterials onto an LED in accordance with still another embodiment of thetechnology.

DETAILED DESCRIPTION

Various embodiments of microelectronic workpieces having LEDs formedthereon and methods for manufacturing such LEDs are described below. Theterm “microelectronic workpiece” is used throughout to includesubstrates upon which and/or in which microelectronic devices,micromechanical devices, data storage elements, read/write components,and other features are fabricated. Substrates can be, for example,semiconductive pieces (e.g., silicon wafers, gallium arsenide wafers, orother semiconductor wafers), nonconductive pieces (e.g., various ceramicsubstrates), or conductive pieces. Well-known structures, systems, andmethods often associated with such systems have not been shown ordescribed in detail to avoid unnecessarily obscuring the description ofthe various embodiments of the technology. A person of ordinary skill inthe relevant art will accordingly understand that the technology mayhave additional embodiments and that the technology may be practicedwithout several of the elements shown and described below with referenceto FIGS. 1A-8.

FIG. 1A is a microelectronic workpiece 100 in the form of asemiconductor wafer 110 that includes multiple microelectronic devicesor components 120. At least some of the processes described below may beconducted on the microelectronic workpiece 100 at the wafer level, andother processes may be conducted on the individual microelectronicdevices 120 of the microelectronic workpiece 100 after the devices 120have been singulated from the larger wafer 110. Accordingly, unlessotherwise noted, structures and methods described below in the contextof a microelectronic workpiece can apply to the wafer 110, the devices120 that are formed from the wafer 110, and/or an assembly of one ormore devices 120 attached to a support member. FIG. 1B is a schematicillustration of an individual device 120 after it has been singulatedfrom the wafer 110 shown in FIG. 1A. The device 120 can include operablemicroelectronic structures, optionally encased within a protectiveencapsulant. For example, the device 120 can include an InGaN and/orother types of LEDs, transistors, capacitors, color filters, mirrors,and/or other types of electrical/mechanical/optical components. Thedevice 120 can be electrically connected to external structural devicesby pins, bond pads, solder balls, redistribution structures, and/orother conductive structures.

FIGS. 2A-6 illustrate various stages of a method for selectivelyapplying light conversion materials onto LEDs in accordance withembodiments of the technology. As described in greater detail below, oneor more light conversion materials or converter materials (e.g.,phosphor) can be applied onto discrete areas of each LED on a workpieceor wafer. The term “phosphor” generally refers to a material that cansustain glowing after exposure to energized particles (e.g., electronsand/or photons). The light conversion material(s) can be patterned orselectively applied onto each LED to help compensate for color variancesacross the wafer. Further, the color(s) of the individual components onthe wafer can be precisely tuned or controlled using the methodsdescribed herein.

FIG. 2A is a partially schematic, top plan view of a portion of amicroelectronic workpiece 200 at an initial processing stage before anylight conversion material has been applied onto the workpiece 200. FIG.2B is a partially schematic, side cross-sectional view takensubstantially along line 2B-2B of FIG. 2A. Referring to FIGS. 2A and 2Btogether, the microelectronic workpiece 200 includes a semiconductorsubstrate 202 having a front or active side 204 (FIG. 2B) and an LED 210(e.g., an InGaN LED) formed at the front side 204 (FIG. 2B). Althoughonly a single LED 210 is shown, it will be appreciated that the methodsdescribed herein with reference to FIGS. 2A-6 may be performed onmultiple devices simultaneously or approximately simultaneously acrossthe workpiece 200.

The workpiece 200 can include several features generally similar to theworkpiece 100 described above with reference to FIGS. 1A and 1B. Thesubstrate 202, for example, can be a semiconductor wafer with aplurality of microelectronic devices or components (e.g., LEDs 210)arranged in a die pattern on the wafer. Individual LEDs 210 also includeterminals 212 (e.g., bond pads as shown in FIG. 2A) and circuitry (notshown) electrically coupled to the terminals 212. One technique forforming the InGaN LEDs can include sequentially applying N-doped GaN,InGaN, and P-doped GaN materials on a sapphire (Al₂O₃) and/or silicon(Si) substrate via epitaxial growth in a metal organic chemical vapordeposition (MOCVD) process. In other embodiments, however, othersuitable techniques may be used to form the LED 210.

Light conversion materials can be selectively applied to the LED 210using a variety of different methods. In the illustrated embodiment, forexample, a first mask or reticle 220 is positioned over the LED 210. Thefirst mask 220 includes a plurality of apertures or openings 222corresponding to a desired pattern for a first light conversion material(not shown—described in detail below with reference to FIGS. 3A and 3B)on the LED 210. The first mask 220 can be a discrete component spacedapart from an upper surface of the LED 210, or the mask 220 may becomposed of a photoresist material or other suitable mask materialapplied on the upper surface of the LED 210 (as shown in broken lines inFIG. 2B) and patterned using photolithography and/or other suitabletechniques. The terminals 212 can also be masked off to prevent shortingor contamination during processing.

Referring to FIGS. 3A and 3B, a first light conversion material or firstconverter material 224 (e.g., yellow phosphor) is applied in a desiredpattern on the LED 210. The first light conversion material 224 can beapplied using a screen printing process and/or other suitable methods.As mentioned above, the first mask 220 is configured to exclude certaincontact areas such that the first light conversion material 224 isselectively applied onto only desired regions of the LED 210. In theillustrated embodiment, the first light conversion material 224comprises a plurality of blocks or “islands” arranged in a selectedpattern on the LED 210. The individual portions of the first lightconversion material 224 are separated from each other by a plurality offirst gaps or channels 225. The pattern shown in FIGS. 3A and 3B ismerely representative of one particular pattern for the first lightconversion material 224. The first light conversion material 224 can beapplied onto the LED 210 in a wide variety of different patterns orarrangements.

The first light conversion material 224 can have a composition thatemits at a desired wavelength when stimulated. For example, in oneembodiment, the first light conversion material 224 can include aphosphor containing Cerium(III)-doped Yttrium Aluminum Garnet (Ce:YAG orYAG:Ce) at a particular concentration. Such a material can emit a broadrange of colors from green to yellow and to red under photoluminescence.In other embodiments, the first light conversion material 224 caninclude Neodymium-doped YAG, Neodymium-Chromium double-doped YAG,Erbium-doped YAG, Ytterbium-doped YAG, Neodymium-cerium double-dopedYAG, Holmium-chromium-thulium triple-doped YAG, Thulium-doped YAG,Chromium(IV)-doped YAG, Dysprosium-doped YAG, Samarium-doped YAG,Terbium-doped YAG, and/or other suitable phosphor compositions. In yetother embodiments, the first light conversion material 224 can includeEuropium phosphors (e.g., CaS:Eu, CaAlSiN₃:Eu, Sr₂Si₅N₈:Eu, SrS:Eu,Ba₂Si₅N₈:Eu, Sr₂SiO₄:Eu, SrSi₂N₂O₂:Eu, SrGa₂S₄:Eu, SrAl₂O₄:Eu,Ba₂SiO₄:Eu, Sr₄All₄O₂₅:Eu, SrSiAl₂O₃N:Eu, BaMgAl₁₀O₁₇:Eu, Sr₂P₂O₇:Eu,BaSO₄:Eu, and/or SrB₄O₇:Eu). The foregoing list of light conversionmaterials is not exhaustive. The phosphor material may also be mixed ina suitable carrier material (epoxy, silicone, etc.).

As mentioned above, the first light conversion material (and anysubsequent light conversion materials) can be selectively applied to theLED 210 using a number of different methods. For example, in anothersuitable method for selectively applying the first light conversionmaterial 224 on the LED 210, a phosphor material (e.g., Ce:YAG) is mixedwith a photosensitive material (e.g., PVA and ammonium dichromate) and alayer of the composition is applied onto the LED 210. Aphotolithographic procedure can be used to selectively expose portionsof the composition such that the exposed portions are “fixed” at desiredlocations on the LED 210 to form the first light conversion material224. This apply/expose/develop process can be repeated any number oftimes to selectively apply additional light conversion materials ontothe LED 210.

Still another suitable technique for selectively applying the firstlight conversion material 224 comprises spinning a photoresist materialonto the LED 210 and patterning the material to form openings overdesired areas or regions of the LED 210. The first light conversionmaterial 224 can be applied into the openings and onto the LED 210 usingelectrophoresis or another suitable process. After applying the firstlight conversion material 224, the photoresist can be removed. In analternative embodiment, rather than using a photosensitive material,some other suitable material may be applied onto the LED 210 and theopenings can be selectively formed using excimer laser ablation oranother suitable process. In yet other embodiments, other suitabletechniques may be used to selectively apply the first light conversionmaterial 224 (and any subsequent light conversion materials) onto theLED 210.

Referring to FIGS. 4A and 4B, a second mask or reticle 230 is positionedover the LED 210. The second mask 230 includes a plurality of aperturesor openings 232 corresponding to a desired pattern for a second lightconversion material (not shown—described in detail below with referenceto FIGS. 5A and 5B) on the LED 210. As with the first mask 220, thesecond mask 230 can be a discrete component spaced apart from an uppersurface of the LED 210, or the second mask 230 may be composed of aphotoresist material or other suitable mask material applied on theupper surface of the LED 210 and patterned using photolithography and/orother suitable techniques.

Referring next to FIGS. 5A and 5B, a second light conversion material234 (e.g., red phosphor) is selectively applied in a desired pattern onthe LED 210. In the illustrated embodiment, for example, the secondlight conversion material 234 comprises a plurality of blocks or“islands” arranged in a selected pattern on the LED 210 in which thesecond light conversion material 234 may or may not contact adjacentportions of the first light conversion material 224. The individualportions of the second light conversion material 234, for example, canbe separated from each other and the first light conversion material 224by a plurality of second gaps or channels 235. The pattern shown inFIGS. 5A and 5B is merely representative of one particular pattern forthe second light conversion material 234. The second light conversionmaterial 234 can be applied onto the LED 210 in a wide variety ofdifferent patterns or arrangements.

The second light conversion material 234 can be composed of materialssimilar to those of the first light conversion material (e.g., Ce:YAG,etc.) described above with reference to FIGS. 3A and 3B. In addition,the second light conversion material 234 may be applied onto the LED 210using processes similar to those used to apply the first lightconversion material 224 described above with reference to FIGS. 3A and3B. In other embodiments, however, the second light conversionalmaterial 234 may be composed of different materials and/or may beapplied onto the LED 210 using different techniques.

FIG. 6 is a partially schematic, top plan view of the workpiece 200after the first and second light conversion materials 224 and 234 havebeen selectively applied on desired portions of the LED 210 and thesecond mask 230 (FIGS. 5A and 5B) has been removed. The LED 210 includesa plurality of uncoated or uncovered portions 240 that do not containany light conversion materials and allow blue light to pass through. TheLED 210 is accordingly configured to produce a desired color of lightbased on the arrangement of and contributions from the uncoated portions240, the portions of first light conversion material 224, and theportions of second light conversion material 234. It will be appreciatedthat the selection of particular compositions for the first and secondlight conversion materials 224 and 234 and the precise placement of thefirst and second light conversion materials 224 and 234 on the LED 210allow the LED 210 to produce any desired color of light (e.g., whitelight). Moreover, although only two light conversion materials aredescribed herein, in other embodiments only a single light conversionmaterial or more than two light conversion materials may be applied ontothe LED 210.

As mentioned previously, although only a single LED 210 is shown abovewith reference to FIGS. 2A-6, the methods described herein may beperformed simultaneously or approximately simultaneously on multipleLEDs 210 across the workpiece 200. In one embodiment, for example, eachLED 210 on the workpiece 200 may be processed using an identical orgenerally identical pattern of light conversion materials. In otherembodiments, however, the pattern of light conversion material(s) on theindividual LEDs 210 may vary across the workpiece 200. For example, onechallenge of manufacturing microelectronic devices at the wafer level isaccounting for variances in the individual microelectronic devices. Ithas been recognized, for example, that processing variances in epitaxialgrowth, chemical-mechanical polishing, wet etching, and/or otheroperations during formation of the microelectronic devices on the samemicroelectronic workpiece may cause the LEDs in one region of theworkpiece 200 to emit light at different wavelengths than anotherregion. As a result, if each LED across the workpiece 200 includes thesame pattern of selectively applied light conversion materials, theemission from at least some of the LEDs may be inconsistent or off white(e.g., tinted to red, blue, and/or green). Embodiments of the methodsdescribed above with reference to FIGS. 2A-6 can address the foregoingemission variations in the LEDs across the workpiece 200 by specificallytailoring the composition of and/or arrangement of the first and secondlight conversion materials 224 and 234 for individual LEDs 210.

In other embodiments, however, rather than customizing the pattern foreach LED 210, a pattern of selectively applied light conversionmaterials can be used for multiple LEDs in a particular region on theworkpiece 200. For example, an operator may measure the emissioncharacteristics of selected LEDs 210 on the workpiece 200 asrepresentative for a region of individual LEDs 210. In furtherembodiments, measured emission characteristics may be averaged,filtered, and/or otherwise manipulated to derive a value asrepresentative for a region of the individual LEDs 210. In still otherembodiments, workpieces to be processed may be sorted beforehand so thata first batch of workpieces having similar emission characteristics canbe processed together using a first selected pattern of light conversionmaterials for device on the individual workpieces, a second batch ofworkpieces can be processed together using a second pattern of lightconversion materials for devices on the individual workpieces, and soon.

FIGS. 7 and 8 illustrate two additional embodiments of methods forselectively applying light conversion materials onto microelectronicworkpieces as described above with respect to FIGS. 2A-6. In each ofFIGS. 7 and 8, several of the features may be the same as thosediscussed above in connection with the workpiece 200 of FIGS. 2A-6.Accordingly, like reference numbers refer to like components in FIG.2A-6 and FIGS. 7 and 8.

FIG. 7, for example, is a partially schematic, top plan view of aworkpiece 300 having light conversion materials applied on the LED 210in accordance with another embodiment of the technology. Morespecifically, the workpiece 300 differs from the workpiece 200 shown inFIGS. 2A-6 in that a first light conversion material 324 and a secondlight conversion material 334 have been selectively applied onto the LED210 in a different pattern than the first and second light conversionmaterials 224 and 234 of FIG. 6. In this embodiment, for example, thefirst light conversion material 324 includes a plurality of generallyconcentric circles across the LED 210. Other shapes, e.g., triangular,hexagonal, etc., are also contemplated. The individual circular portionsof the first light conversion material 324 are separated by channels orgaps 325. A portion of these channels or gaps 325 comprise uncoatedregions 340 that allow blue light from the LED 210 to pass through.

FIG. 8 is a partially schematic, top plan view of a workpiece 400 havinglight conversion materials applied onto the LED 210 in accordance withstill another embodiment of the technology. The workpiece 400 differsfrom the workpieces 200 and 300 described above with reference to FIGS.2A-7 in that a first light conversion material 424 has been applied ontothe LED 210 in a plurality of individual rectilinear portions across theLED 210. The individual rectilinear portions of the first lightconversion material 424 are separated by channels or gaps 425.Individual portions of a second light conversion material 434 areapplied onto the LED 210 in a pattern generally corresponding to thearrangement of the rectilinear portions of the first light conversionmaterials 424. In still other embodiments, portions of the first and/orsecond light conversion materials can be selectively applied onto theLED 210 in other shapes (e.g., polygonal) or suitable patterns.

From the foregoing, it will be appreciated that specific embodiments ofthe technology have been described herein for purposes of illustration,but that various modifications may be made without deviating from thespirit and scope of the technology. For example, structures and/orprocesses described in the context of particular embodiments may becombined or eliminated in other embodiments. In particular, thearrangement of the first and/or second light conversion materialsdescribed above with reference to particular embodiments can include oneor more additional light conversion materials selectively applied ontoselected LEDs across the wafer, or one or more of the light conversionmaterials described above can be omitted. Moreover, while advantagesassociated with certain embodiments of the technology have beendescribed in the context of these embodiments, other embodiments mayalso exhibit such advantages, and not all embodiments need necessarilyexhibit such advantages to fall within the scope of the technology.Accordingly, embodiments of the technology are not limited except as bythe appended claims

1. A method for manufacturing a light emitting diode (LED), the methodcomprising: applying a first light conversion material to a first regionon the LED; and applying a second light conversion material to a second,different region on the LED, wherein at least a portion of the LED isexposed after applying the first and second light conversion materials.2. The method of claim 1 wherein the LED is one of a plurality of LEDson a workpiece, and wherein the method further comprises: applying thefirst light conversion material to the first region on multiple LEDs onthe workpiece; and applying the second light conversion material to thesecond region on multiple LEDs on the workpiece.
 3. The method of claim2 wherein: the first light conversion material is applied to two or moreLEDs on the workpiece simultaneously or approximately simultaneously;and the second light conversion material is applied to two or more LEDson the workpiece simultaneously or approximately simultaneously.
 4. Themethod of claim 2 wherein each LED on the workpiece includes the samearrangement of first and second light conversion materials.
 5. Themethod of claim 2 wherein each LED on the workpiece includes a differentarrangement of first and second light conversion materials.
 6. Themethod of claim 2 wherein the workpiece includes a first set of LEDshaving a first emission characteristic and a second set of LEDs having asecond emission characteristic different than the first emissioncharacteristic, and wherein: the first and second light conversionmaterials have a first arrangement relative to each other on each LED inthe first set of LEDs; and the first and second light conversionmaterials have a second arrangement relative to each other on each LEDin the second set of LEDs, and wherein the second arrangement isdifferent than the first arrangement.
 7. The method of claim 1 applyinga second light conversion material to a second, different region on theLED comprising applying the second light conversion material such thatthe first light conversion material is spaced apart from the secondlight conversion material.
 8. The method of claim 1 wherein: applyingthe first light conversion material to the first region comprisesapplying the first light conversion material in a plurality ofindividual first rectilinear blocks on the LED with first channelsseparating the individual first blocks from each other; and applying thesecond light conversion material to the second region comprises applyingthe second light conversion material in a plurality of individual secondrectilinear blocks on the LED with second channels separating theindividual second blocks from each other and from the first blocks. 9.The method of claim 1, further comprising: selecting the first lightconversion material before applying the first light conversion material,wherein selecting the first light conversion material comprisesselecting at least one of a composition, a concentration, and a quantityof a first phosphor such that the first phosphor has a desired firstemission wavelength; and selecting the second light conversion materialbefore applying the second light conversion material, wherein selectingthe second light conversion material comprises selecting at least one ofa composition, a concentration, and a quantity of a second phosphor suchthat the second phosphor has a desired second emission wavelength. 10.The method of claim 1 wherein: the first light conversion materialcomprises a yellow or yellowish phosphor, and the second lightconversion material comprises a red phosphor.
 11. The method of claim 1wherein applying the first light conversion material and applying thesecond light conversion material comprises screen printing the first andsecond light conversion materials onto the LED.
 12. The method of claim1 wherein: applying the first light conversion material comprisesapplying the first light conversion material using a firstphotolithographic process; and applying the second light conversionmaterial comprises applying the second light conversion material using asecond photolithographic process.
 13. The method of claim 1 wherein thefirst light conversion material comprises a first phosphor and thesecond light conversion material comprises a second phosphor, andwherein: applying the first light conversion material comprises—applying and patterning a first photoresist material on the LED; anddepositing the first phosphor into openings in the first photoresistmaterial using electrophoresis; and applying the second light conversionmaterial comprises— removing the first photoresist material; applyingand patterning a second photoresist material on the LED; depositing thesecond phosphor into openings in the second photoresist material usingelectrophoresis; and removing the second photoresist material.
 14. Themethod of claim 1 wherein the LED is one of a plurality of LEDs on aworkpiece, and wherein the method further comprises measuring anemission characteristic of a plurality of LEDs on the workpiece beforeapplying the first light conversion material.
 15. The method of claim 1,further comprising selecting a first pattern for the first lightconversion material on the LED and a second pattern for the second lightconversion material on the LED based, at least in part, on a measuredemission characteristic of the LED such that a combined emission fromthe LED and the first and second light conversion materials at leastapproximates a white light.
 16. The method of claim 1, furthercomprising selecting a composition for the first light conversionmaterial and a composition for the second light conversion materialbased, at least in part, on a measured emission characteristic of theLED such that a combined emission from the LED and the first and secondlight conversion materials at least approximates a white light.
 17. Amethod for modifying an emission characteristic of individual lightemitting diodes (LEDs) of a microelectronic workpiece, the methodcomprising: selectively applying a first phosphor material onto each LEDin a first pattern; and selectively applying a second phosphor materialonto each LED in a second pattern different than the first pattern; andwherein for the individual LEDs, a combined emission from thecorresponding LED, the first phosphor material, and the second phosphormaterial produces a light having desired spectral constituents.
 18. Themethod of claim 17, further comprising forming a plurality of LEDs onthe workpiece substrate before modifying an emission characteristic ofthe individual LEDs, and wherein forming individual LEDs comprisessequentially applying an N-type gallium nitride (GaN), an indium galliumnitride (InGaN), and P-type GaN onto a silicon substrate via epitaxialgrowth.
 19. The method of claim 17 wherein each LED comprises an InGaNLED, and wherein: applying a first phosphor material comprises applyinga yellow phosphor containing Cerium(III)-doped Yttrium Aluminum Garnet(Ce:YAG), and wherein the first pattern comprises an array of firstportions across the individual LEDs; applying a second phosphor materialcomprises applying a red phosphor containing Ce:YAG, and wherein thesecond pattern comprises an array of second portions across theindividual LEDs and out of contact with the first portions, and furtherwherein the first and second portions do not completely cover the LED.20. The method of claim 17 wherein modifying an emission characteristicof individual LEDs comprises adjusting the emission characteristics ofthe LEDs such that the emission from each LED at least approximates awhite light.
 21. The method of claim 17, further comprising applying athird phosphor material onto each LED in a third pattern different thanthe first and second patterns, and wherein a combined emission from thecorresponding LED, the first phosphor material, the second phosphormaterial, and the third phosphor material produces a desired color oflight.
 22. The method of claim 17 wherein the workpiece comprises afirst workpiece including a plurality of first LEDs, and wherein themethod further comprises processing a second workpiece including aplurality of second LEDs by— selectively applying the first phosphormaterial onto each second LED in the first pattern; and selectivelyapplying the second phosphor material onto each second LED in the secondpattern, wherein for the individual second LEDs, a combined emissionfrom the corresponding second LED, the first phosphor material, and thesecond phosphor material produces the desired color of light.
 23. Amethod for color correction of light emitting diodes (LEDs), the methodcomprising: forming a first color correction material over a firstdiscrete area of an LED, wherein the first color correction materialcomprises a first phosphor having a first emission wavelength; andforming a second color correction material over a second discrete areaof the LED, wherein the second color correction material comprises asecond phosphor having a second emission wavelength different than thefirst emission wavelength, and wherein a combined emission from the LEDand the first and second color correction materials at leastapproximates a white light.
 24. A microelectronic workpiece, comprising:a semiconductor substrate; and a plurality of light emitting diodes(LEDs) on the substrate, wherein the individual LEDs include— a firstconverter material in a first predetermined pattern on the LED; and asecond converter material in a second predetermined pattern on the LED,wherein the second pattern is different than the first pattern, andwherein at least a portion of the LED is accessible through the firstand second patterns, wherein a combined emission from the LED, the firstconverter material, and the second converter material produces a lighthaving desired spectral constituents.
 25. The microelectronic workpieceof claim 24 wherein: the individual LEDs on the substrate comprise anindium gallium nitride (InGaN) material between an N-type galliumnitride (GaN) material and a P-type GaN material; the first convertermaterial comprises a yellow phosphor material; and the second convertermaterial comprises a red phosphor.
 26. The microelectronic workpiece ofclaim 24 wherein: the first pattern comprises an array of first blocksacross the LED and separated by first gaps; and the second patterncomprises an array of second blocks across the LED and separated bysecond gaps.
 27. The microelectronic workpiece of claim 26 wherein: thefirst blocks include generally circular, rectilinear, and/orpolygonal-shaped blocks; and the second blocks include generallycircular, rectilinear, and/or polygonal-shaped blocks.
 28. Themicroelectronic workpiece of claim 24 wherein the first convertermaterial is spaced apart from the second converter material by a gap onthe individual LEDs.